Project objectives

The main objectives of the project overall are:

1. to select a tracer gas possessing light-induced optical properties appropriate for application as a working enviroment sensitive to the external electric field distribution;
   
2. to develop the methodology of optical mapping (imaging) of the electric field potential distribution on the open surface of semiconductor devices;
   
3. to develope the medology for monitoring time evolution of the electric field potential distribution;
   
4. to create and implement a fast non-contact optical testing camera for technology control of pads, wirebonding and surface topoplogy of semiconductor arrays.

As distinct from conventional contact-based testing techniques, the optical testing camera will allow

1. simultaneous in situ testing of the large number of contact points;
2. mapping of the electric potential with the high spatial resolution typical for an optical microscope;
3. monitoring fast time evolution of the electric field distribution;
4. testing non-traditional kinds of IC defects] (delay faults, and temporary bridges, etc.);
5. (4) extension to other areas such as monitoring ion transport surface potential in biological cells, etc.

Since the optical electric field testing allows for control (including "in-situ" monitoring) of high-cost technological process in the semiconductor industry, commercializing the technology will result in maximizing IC design productivity and increasing the design/cost ratio in the semiconductor industry.